Hiden Analytical introduce the new wide-range HMT Series quadrupole process monitor featuring integrated high/low pressure monitoring capability for diverse vacuum and semiconductor processes, free from differential pumping requirements.

The dual-mode system operates at process pressures to 10-2 mbar yet monitors at UHV pressures to 10-11 mbar, equally suited to base-vacuum residual gas analysis with high sensitivity leak detection and to insitu monitoring of the process for composition, reproducibility, contaminants and feed-gas stability.

Control programmes enable hands-free data acquisition with event monitor alarms automatically indicating out-of-process conditions. Process statistics are continuously updated and logged for process-to-process comparison.

The mass range of 100 amu accommodates all common gases and hydro/fluorocarbons in applications including vacuum furnacing and diverse semiconductor etch, deposition and coating processes..