2005年2月，英国　Hiden Analytical Ltd. 正式宣布新一代的二次离子质谱仪（SIMS）“MAXIM”诞生。该仪器具有很高的性价比，是进行材料表面分析的得力工具。

The Hiden Analytical UHV surface analysis system range is further extended by the addition of ‘MAXIM', a high-performance quadrupole secondary ion monitor specifically designed for optimum sensitivity for surface analysis and depth profiling applications for a wide range of materials including polymers, superconductors, semiconductors, alloys and dielectric, with measurement of trace components to sub-ppm levels.

‘MAXIM' features a ten-fold increase in detection capability to 10 6 counts per second per nanoamp for argon-aluminium, mass range options from 300amu to 1000amu and detection of both positive and negative ions through a dynamic range of 7 decades. An internally generated raster scan is used for primary beam deflection which, together with the synchronous data acquisition facility, enables precise surface mapping. The acquisition region is additionally user-definable and software-selectable within the total raster area for depth profile studies.

‘MAXIM' systems are offered to supplement existing user surface analysis stations and, together with a selection of primary excitation sources, provide a complete SIMS facility. Additionally ‘MAXIM' is offered fully integrated in a cost-effective UHV SIMS Workstation complete with sample manipulator, load lock/sample transfer mechanism and full vacuum and bakeout services with capacity for sample sizes to 50mm.